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10) The "Bosch Process" is used for which of the following etching profiles?O Reactive lon EtchingO Wet EtchingO Deep Reactive lon EtchingO None of the Above |
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Answer» Answer: The correct answer is Deep REACTIVE Ion Etching. The 'Bosch Process' is used for the Deep RIE etching profiles. Explanation: The Bosch process mainly works in two modes: 1. Isotropic PLASMA etch( which is standard). 2. Deposition of a passivation layer( which is basically inert)- prevents further etching. The Deep Reactive Ion Etching was mainly DEVELOPED for FACILITATING Microelectromehanical systems or MEMS. |
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