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10) The "Bosch Process" is used for which of the following etching profiles?O Reactive lon EtchingO Wet EtchingO Deep Reactive lon EtchingO None of the Above​

Answer»

Answer:

The correct answer is Deep REACTIVE Ion Etching. The 'Bosch Process' is used for the Deep RIE etching profiles.

Explanation:

The Bosch process mainly works in two modes:

1. Isotropic PLASMA etch( which is standard).

2. Deposition of a passivation layer( which is basically inert)- prevents further etching.

The Deep Reactive Ion Etching was mainly DEVELOPED for FACILITATING Microelectromehanical systems or MEMS.



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