

InterviewSolution
Saved Bookmarks
1. |
In maskant application, photo-resist masks ensure which of the following advantages?(a) High accuracy(b) Ease of repetition(c) Ease of modification(d) All of the mentionedThe question was posed to me in unit test.I'm obligated to ask this question of CHM topic in chapter Chemical Processes of Advanced Machining |
Answer» Correct answer is (d) All of the MENTIONED |
|